Studi Penumbuhan Film Tipis Ti1-xCoxO2 dengan Teknik MOCVD Menggunakan Prekursor Titanium (IV) Isopropoxide dan Tris (2,2,6,6-tetramethyl-3, 5-heptanedionato) Cobalt (III)

Horasdia Saragih, Edy Supriyanto, Pepen Arifin, Mohammad Barmawi


The Ti1-xCoxO2 thin films have been grown by MOCVD technique using titanium (IV) isopropoxide (TTIP) and tris (2,2,6,6-tetramethyl-3, 5-heptanedionato) Cobalt (III) [Co(TMHD)3] powder precursors. The tetrahydrofuran (THF) were used as a solvent to get a Co(TMHD)3 solution. Characteristics of precursor and growth parameters were investigated. The Co concentration in thin films were varied. The room temperature ferromagnetic properties of Ti1-xCoxO2 thin films were obtained. Solubility of Co atom in TiO2 lattice were found at about 11%. The surface morphology of films are homogen and relatively smooth.

Full Text:




  • There are currently no refbacks.

View my Stats

Creative Commons License
This work is licensed under a Creative Commons Attribution-NoDerivatives 4.0 International License.


Lembaga Penelitian dan Pengabdian kepada Masyarakat (LPPM), Center for Research and Community Services (CRCS) Building, 6th & 7th Floor, Institut Teknologi Bandung, Jalan Ganesha 10, Bandung 40132, Indonesia, Tel. +62-22-86010080, Fax.: +62-22-86010051; E-mail: